Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element
Patent
1997-02-25
2000-03-14
Ballato, Josie
Electricity: measuring and testing
Fault detecting in electric circuits and of electric components
Of individual circuit component or element
324691, G01R 3102, G01R 2708
Patent
active
060377909
ABSTRACT:
In-situ identification of faulty electrical contacts in an electroprocessing fixture involves measuring resistance of contact pairs while the workpiece is mounted in the fixture, and calculating a resistance of an individual contact from the contact pair resistances. The individual contact resistances are compared with a maximum allowable resistance, and any contact having an individual resistance exceeding the maximum allowable resistance is identified as faulty. Faulty contacts are reseated, and then remeasured. The remeasuring can be of a subset of the whole set of contacts in the fixture.
REFERENCES:
patent: 3928795 (1975-12-01), Lechner
patent: 4232262 (1980-11-01), Emo et al.
patent: 4342957 (1982-08-01), Russell
patent: 4342958 (1982-08-01), Russell
patent: 4578637 (1986-03-01), Allen et al.
patent: 5202639 (1993-04-01), McKeon et al.
patent: 5369358 (1994-11-01), Metzger et al.
patent: 5444390 (1995-08-01), Bartlett et al.
patent: 5485095 (1996-01-01), Bertsch et al.
IBM Technical Disclosure Bulletin vol. 25 No. 12 May 1983; "Testing Tester Relays Within A Tester", R.D. Burke and PC. Reichert.
Anderson Jay H.
Ballato Josie
International Business Machines - Corporation
Kobert Russell M.
Mortinger Alison D.
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