Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...
Patent
1994-09-20
1998-01-06
Bell, Janyce
Coating processes
Direct application of electrical, magnetic, wave, or...
Polymerization of coating utilizing direct application of...
427240, 4273855, 427498, 427508, 427521, 427542, 437231, C08J 704, B05D 312
Patent
active
057052328
ABSTRACT:
This is a system and method of in-situ coating, baking and curing of dielectric material. The system may include: dispensing apparatus for dispensing spin-on material; a lamp module 50; a window 54 connected to the lamp module 50; an environmental control chamber 56 connected to the window 54; an access gate 60 for wafers 58 in the environmental control chamber 56; a spin chuck 62 inside the environmental control chamber 56; and an exhaust pipe 64 connected to the environmental control chamber 56. The lamp module 50 may contains infra red and ultra violet lamps. In addition, the coating chamber may process dielectric material such as spin-on glass, silicon dioxide and various other spin-on material.
REFERENCES:
patent: 4534816 (1985-08-01), Chen et al.
patent: 4826709 (1989-05-01), Ryan
patent: 4871417 (1989-10-01), Nishizawa et al.
patent: 4913790 (1990-04-01), Narita et al.
patent: 4957777 (1990-09-01), Ilderem et al.
patent: 5006370 (1991-04-01), Eisenbaum et al.
patent: 5098198 (1992-03-01), Nulman et al.
patent: 5238878 (1993-08-01), Shinoharg
patent: 5246728 (1993-09-01), Rodriquez
patent: 5276126 (1994-01-01), Rogler
patent: 5376408 (1994-12-01), Lippert
patent: 5444217 (1995-08-01), Moore et al.
Horiuchi Toyotaro
Hwang Ming
Shu Jing
Ying Peter
Bell Janyce
Denker David
Donaldson Richard L.
Kesterson James C.
Texas Instruments Incorporated
LandOfFree
In-situ coat, bake and cure of dielectric material processing sy does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with In-situ coat, bake and cure of dielectric material processing sy, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and In-situ coat, bake and cure of dielectric material processing sy will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2327278