In Situ alignment system for phase-shifting point-diffraction in

Details In Situ alignment system for phase-shifting point-diffraction in In Situ alignment system for phase-shifting point-diffraction in

1999-06-02

2000-09-12

Kim, Robert H.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356353, 356359, G01B 902

Patent

active

061185353

ABSTRACT:
A device and method to facilitate the gross alignment of patterned object- and image-plane masks in optical systems such as the phase-shifting point diffraction interferometer are provided. When an array of similar pinholes or discreet mask fields is used, confusion can occur over the alignment of the focused beams within the field. Adding to the mask pattern a circumscribed or inscribed set of symbols that are identifiable in situ facilitates the unambiguous gross alignment of the object- and/or image-plane masks. Alternatively, a system of markings can be encoded directly into the window shape to accomplish this same task.

REFERENCES:
patent: 4953981 (1990-09-01), Halen
patent: 5835217 (1998-11-01), Medecki
Attwood, David et al., "Underulator Radiation for At-Wavelength Interferometry of Optics for Extreme-Ultraviolet Lithography", Applied Optics, 32 (34), 7022-7031, 1993.
Goldberg, K.A. et al., "High-Accuracy Interferometry of EUV Lithographic Optical Systems", J. of Vac. Sci. & Tech. B, 16 (6), 3435-3439, 1998.
Linnik, W.P., "A Simple Interferometer for the Investigation of Optical Systems", Applied Optics, 18 (12), 2010-2012, 1979.
Medecki, H., et al., "Phase-Shifting Point-Diffraction Interferometer", Optics Letters, 21 (19), 1526-1528, 1996.
Smartt, R.N., et al., "Theory and Application of Point-Diffraction Interferometers", Japanese J. of Applied Physics, 14 Suppl. (14-1), 351-356, 1975.
Speer, R.J., et al., "Grazing Incidence Interferometry: The Use of the Linnik Interferometer for Testing Image-Forming Reflection Systems", Applied Optics, 18 (12), 2003-2012, 1979.

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