Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Reexamination Certificate
2007-02-20
2007-02-20
Bueker, Richard (Department: 1763)
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
C118S721000, C204S298110
Reexamination Certificate
active
10695343
ABSTRACT:
A variable adaptive mask is provided that can be dynamically modified in situ in a physical vapor deposition process. The mask comprises a fixed mask portion, a plurality of channels extending through the fixed mask portion, a control mechanism for controlling throughput of a vaporized target material through the channels, and a mechanism to mount the mask in a fixed position relative to a solid target material and a substrate. In one embodiment, a magnetic control mechanism is provided to control throughput of the vaporized target material through the channels. In another embodiment, a thermal control mechanism is provided to control throughput of a vaporized target material through the channels. Methods of controlling a physical vapor deposition process using the adaptive mask are also disclosed.
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Freeman William
Qin Lillian
Zhang Yin
Bueker Richard
Finisar Corporation
Workman Nydegger
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