Optics: measuring and testing – Dimension – Thickness
Reexamination Certificate
2005-02-08
2010-10-26
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
Dimension
Thickness
C156S345100, C438S001000
Reexamination Certificate
active
07821655
ABSTRACT:
An apparatus and process for in-situ measurement of thin film thickness, ash rate, and end point generally include generating and measuring shallow angle interference patterns. The apparatus generally includes a chamber having a first viewing port and a second viewing port. The first viewing port includes receiving optics configured to receive light at a shallow angle from a surface of a substrate processed therein. The second port includes a broadband illumination source and is preferably disposed in a sidewall opposite the receiving optics. The process includes calculating the thin film thickness, ash rate, and end point from the interference patterns.
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Janos Alan
Saubhayana Montien
Axcelis Technologies Inc.
Cantor & Colburn LLP
Chowdhury Tarifur
Pajoohi Tara S
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