Optics: measuring and testing – Of light reflection
Reexamination Certificate
2007-08-07
2011-11-29
Pham, Hoa (Department: 2886)
Optics: measuring and testing
Of light reflection
C385S037000
Reexamination Certificate
active
08068228
ABSTRACT:
A structure that is located adjacent to a measurement target on a substrate is used to convert incident radiation from an optical metrology device to be in-plane with the measurement target. The structure may be, e.g., a grating or photonic crystal, and may include a waveguide between the structure and the measurement target. The in-plane light interacts with the measurement target and is reflected back to the structure, which converts the in-plane light to out-of-plane light that is received by the optical metrology device. The optical metrology device then uses the information from the received light to determine one or more desired parameters of the measurement target. Additional structures may be used to receive light that is transmitted through or scattered by the measurement target if desired.
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Nanometrics Incorporated
Pham Hoa
Silicon Valley Patent & Group LLP
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