In-place bonding of microstructures

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates

Reexamination Certificate

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C257SE21088

Reexamination Certificate

active

07456081

ABSTRACT:
A method for bonding microstructures to a semiconductor substrate using attractive forces, such as, hydrophobic, van der Waals, and covalent bonding is provided. The microstructures maintain their absolute position with respect to each other and translate vertically onto a wafer surface during the bonding process. The vertical translation of the micro-slabs is also referred to herein as “in-place bonding”. Semiconductor structures which include the attractively bonded microstructures and substrate are also disclosed.

REFERENCES:
patent: 4933601 (1990-06-01), Sagawa et al.
patent: 5473192 (1995-12-01), Golubic et al.
patent: 5923091 (1999-07-01), Nagai
patent: 6666979 (2003-12-01), Chinn et al.
patent: 6767802 (2004-07-01), Maa et al.
patent: 6858518 (2005-02-01), Kondo
patent: 7041178 (2006-05-01), Tong et al.
patent: 2002/0182775 (2002-12-01), Belford
patent: 2003/0006416 (2003-01-01), Dudoff et al.
patent: 2003/0013287 (2003-01-01), Lochtefeld et al.
patent: 2003/0186073 (2003-10-01), Fitzgerald
patent: 2004/0029356 (2004-02-01), Timme et al.
patent: 2004/0075141 (2004-04-01), Maeda et al.
patent: 2004/0126958 (2004-07-01), Usuda et al.
patent: 2004/0251464 (2004-12-01), Lee
patent: 2004/0253792 (2004-12-01), Cohen et al.
patent: 2005/0020094 (2005-01-01), Forbes et al.
patent: 2005/0227455 (2005-10-01), Park et al.
patent: 2006/0011982 (2006-01-01), Forbes
Rikard A. Wind, et al. “Fabrication of Nanoperiodic Surface Structures by Controlled Etching of Dislocations in Bicrystals” Applied Physics Letters, Apr. 9, 2001, pp. 2205-2207, vol. 78, No. 15.
Vamsi K. Paruchuri, et al. “The Effect of Cosurfactants on Sodium Dodecyl Sulfate Micellar Structures at a Graphite Surface” Colloids and Surfaces A: Physiochem. Eng. Aspects, 2006, pp. 157-163.
P.M. Mooney, et al. “Elastic Strain Relaxation in Free-Stainding SiGe/Si Structures” Applied Physics Letters, Feb. 16, 2004, pp. 1093-1095, vol. 84, No. 7.

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