In-line process monitoring using micro-raman spectroscopy

Details In-line process monitoring using micro-raman spectroscopy In-line process monitoring using micro-raman spectroscopy

1998-11-05

1999-09-21

Kim, Robert H.

Optics: measuring and testing

By dispersed light spectroscopy

With raman type light scattering

438305, G01J 344, H01L 2100

Patent

active

059561378

ABSTRACT:
An in-line non-destructive method is described for identifying phases in a micro-structure such as a fine line pattern. This is accomplished by observing the Raman spectrum of the micro-structure. A particular application is a silicide layer, prepared using the SALICIDE process, where the crystal phases before and after Rapid Thermal Anneal are often different. This is reflected by the appearance of different lines in the Raman spectra so that the fraction of each phase can be determined. If the silicide layer agglomerated during the anneal, this is also detected by the Raman spectrum. The method has been used successfully down to line widths of about 0.35 microns.

REFERENCES:
patent: 5017007 (1991-05-01), Milne et al.
patent: 5286678 (1994-02-01), Rastogi
patent: 5744395 (1998-04-01), Shue et al.
patent: 5844684 (1998-12-01), Maris et al.

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