In-line lithography and etch system

Details In-line lithography and etch system In-line lithography and etch system

2009-03-12

2010-11-30

Mulpuri, Savitri (Department: 2812)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

C438S011000, C438S014000, C438S018000, C700S109000, C700S110000, C700S121000, C703S002000, C716S030000, C716S030000, C257SE21525, C257SE21529

Reexamination Certificate

active

07842519

ABSTRACT:
The invention can provide a method of processing a wafer using Site-Dependent (S-D) processing sequences that can include S-D creation procedures, S-D evaluation procedures, and S-D transfer sequences. The S-D creation procedures can be performed using S-D processing elements, the S-D evaluation procedures can be performed using S-D evaluation elements, and S-D transfer sequences can be performed using site-dependent transfer subsystems. Site-dependent data can be stored in site-dependent libraries and/or databases.

REFERENCES:
patent: 6610150 (2003-08-01), Savage et al.
patent: 7230441 (2007-06-01), Carlson-Stevermer
patent: 7373216 (2008-05-01), Winkler et al.
patent: 2003/0015660 (2003-01-01), Shishido et al.
patent: 2005/0187649 (2005-08-01), Funk et al.
patent: 2006/0292845 (2006-12-01), Chiang et al.

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