Chemistry: analytical and immunological testing – Process or composition for determination of physical state... – Surface area – porosity – imperfection – or alteration
Reexamination Certificate
2008-07-15
2008-07-15
Griffin, Walter D. (Department: 1797)
Chemistry: analytical and immunological testing
Process or composition for determination of physical state...
Surface area, porosity, imperfection, or alteration
C436S178000, C438S014000
Reexamination Certificate
active
11009096
ABSTRACT:
The present invention provides an impurity measuring method comprising the steps of dropping a drop of a first solution on the surface of a substrate to be measured, moving the drop dropped on the surface of the substrate so that the drop is kept in contact with the surface and collects an impurity absorbed on the surface, recovering the drop after the movement and analyzing the recovered drop by chemical analysis to determine the type and concentration of the impurity, characterized in that the first solution is phobic to the substrate and the substrate consists substantially of Ge. The method is of particular importance for measuring metallic contamination on the surface of Ge substrates.
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Hellin et al.Determination of Metallic Contaminants on GE Wafers using direct-and Droplet Sandwich etch-Total Reflection X-ray Fluorescence Spectrometry, pp. 2093-2104, 2003. Spectrochimica Acta Part B. vol. 58 No. 12; XP002323124.
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European Patent Office Search Report, filed in Application No. 04447274, mailed on Apr. 15, 2005.
Hellin David
Steenbergen Jan Van
Teerlinck Ivo
Griffin Walter D.
Interuniversitair Microelektronica Centrum (IMEC)
Knobbe Martens Olson & Bear LLP
Mui Christine T
UMICORE N.V.
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