Improving etch-resistance of casein-based photoresist pattern

Details Improving etch-resistance of casein-based photoresist pattern Improving etch-resistance of casein-based photoresist pattern

1979-06-04

1981-03-31

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

1566591, 430313, 430318, 430323, 430331, 427 96, 427338, 106138, 264129, G03C 500

Patent

active

042594219

ABSTRACT:
The etch resistance of a casein-based photoresist pattern to low specific gravity ferric chloride-based etchant solutions is increased by treating the photoresist pattern with a methylene blue solution, containing at least 0.1 weight percent methylene blue, prior to exposure to the etchant solution.

REFERENCES:
patent: 2908667 (1959-10-01), Williams
patent: 3157501 (1964-11-01), Burrows et al.
patent: 3698902 (1972-10-01), Gaspar
patent: 4061529 (1977-12-01), Goldman et al.
patent: 4158566 (1979-06-01), Goldman

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