Improvements in sensitivity of a positive polymer resist having

Details Improvements in sensitivity of a positive polymer resist having Improvements in sensitivity of a positive polymer resist having

1985-07-31

1986-08-26

Childs, Sadie L.

Coating processes

With post-treatment of coating or coating material

Heating or drying

430327, 430330, 430347, B05D 302

Patent

active

046082816

ABSTRACT:
The present invention is a method to increase the sensitivity of a positive polymer resist by control of molecular weight distribution and prebake temperature. The sensitivity of a polymer positive resist is increased by baking a narrow molecular weight fraction resist below the glass transition temperature. More particularly the sensitivity is increased by the use of low average molecular weight resist of narrow molecular weight distribution.

REFERENCES:
patent: 3535137 (1970-10-01), Haller et al.
patent: 3827908 (1974-08-01), Johnson et al.
patent: 3894163 (1975-07-01), Broyde
patent: 4078098 (1978-03-01), Cortellino
patent: 4087569 (1978-05-01), Hatzakis
patent: 4476217 (1984-10-01), Douglas et al.

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