Coating processes – Direct application of electrical – magnetic – wave – or... – Electrostatic charge – field – or force utilized
Reexamination Certificate
2006-11-28
2006-11-28
Ha, Nathan W. (Department: 2814)
Coating processes
Direct application of electrical, magnetic, wave, or...
Electrostatic charge, field, or force utilized
C438S691000, C438S700000, C438S735000
Reexamination Certificate
active
07141275
ABSTRACT:
A method is provided for imprinting a pattern having nanoscale features from a mold into the patternable layer on a substrate. The method comprises: providing the mold; forming the patternable layer on the substrate; and imprinting the mold into the patternable layer, wherein the patternable layer comprises a metal or alloy having a transition temperature from its solid form to its liquid form that is within a range of at least 10° above room temperature.
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Ha Nathan W.
Hewlett--Packard Development Company, L.P.
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