Imprint lithography utilizing silated acidic polymers

Details Imprint lithography utilizing silated acidic polymers Imprint lithography utilizing silated acidic polymers

2005-07-14

2009-11-17

Del Sole, Joseph S. (Department: 1791)

Plastic and nonmetallic article shaping or treating: processes

Mechanical shaping or molding to form or reform shaped article

Shaping against forming surface

C264S299000, C264S310000

Reexamination Certificate

active

07618574

ABSTRACT:
A synthesis for a silated acidic polymer by a copolymerization of several monomers includes one acidic monomer and one silated monomer. The silated acidic polymer is used as a resist barrier in imprint lithography and is easily removed by an environmental basic aqua-solution during the stripping process without using RIE (reactive ion etching) process or organic solvent at the last step of resist stripping so that the throughput is enhanced and good etching resistibility together with cost-saving is obtained.

REFERENCES:
patent: 4801658 (1989-01-01), Furukawa et al.
patent: 02308801 (1990-12-01), None
patent: 2003342128 (2003-12-01), None
patent: WO 88/09527 (1988-12-01), None

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