Imprint lithography

Details Imprint lithography Imprint lithography

2008-05-27

2008-05-27

Gupta, Yogendra N. (Department: 1791)

Plastic article or earthenware shaping or treating: apparatus

Means applying electrical or wave energy directly to work

Radiated energy

C430S022000, C430S324000, C264S401000, C425S385000

Reexamination Certificate

active

07377764

ABSTRACT:
A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.

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Heon Lee et al., Full Wafer Scale Near Zero Residual Nano-Imprinting Lithography Using UV Curable Monomer Solution, Microelectronic Engineering 77 (2005) pp. 42-47.
Stephen Y. Chou, et al., “Nanoimprint Lithography”, J. Vac. Sci. Technol. B 14(6), Nov./Dec. 1996, pp. 4129-4133.

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