Plastic and nonmetallic article shaping or treating: processes – Mechanical shaping or molding to form or reform shaped article – Shaping against forming surface
Reexamination Certificate
2011-03-15
2011-03-15
Nguyen, Khanh (Department: 1746)
Plastic and nonmetallic article shaping or treating: processes
Mechanical shaping or molding to form or reform shaped article
Shaping against forming surface
C264S299000, C264S239000
Reexamination Certificate
active
07906059
ABSTRACT:
An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state.
REFERENCES:
patent: 5512131 (1996-04-01), Kumar et al.
patent: 5772905 (1998-06-01), Chou
patent: 6123890 (2000-09-01), Mazurek et al.
patent: 6165911 (2000-12-01), Calveley
patent: 6309580 (2001-10-01), Chou
patent: 6334960 (2002-01-01), Willson et al.
patent: 6365059 (2002-04-01), Pechenik
patent: 6375870 (2002-04-01), Visovsky et al.
patent: 6482742 (2002-11-01), Chou
patent: 6518189 (2003-02-01), Chou
patent: 6656341 (2003-12-01), Petersson et al.
patent: 6696220 (2004-02-01), Bailey et al.
patent: 6719915 (2004-04-01), Willson et al.
patent: 6805054 (2004-10-01), Meissl et al.
patent: 6921615 (2005-07-01), Sreenivasan et al.
patent: 2002/0093122 (2002-07-01), Choi et al.
patent: 2002/0094496 (2002-07-01), Choi et al.
patent: 2002/0132482 (2002-09-01), Chou
patent: 2002/0167117 (2002-11-01), Chou
patent: 2002/0177319 (2002-11-01), Chou
patent: 2003/0034329 (2003-02-01), Chou
patent: 2003/0080471 (2003-05-01), Chou
patent: 2003/0080472 (2003-05-01), Chou
patent: 2003/0081193 (2003-05-01), White et al.
patent: 2003/0127580 (2003-07-01), Ling et al.
patent: 2003/0139042 (2003-07-01), Heidari
patent: 2003/0141291 (2003-07-01), Heidari et al.
patent: 2003/0159608 (2003-08-01), Heidari
patent: 2003/0170053 (2003-09-01), Montelius et al.
patent: 2003/0189273 (2003-10-01), Olsson
patent: 2004/0005444 (2004-01-01), Heidari
patent: 2004/0009673 (2004-01-01), Sreenivasan et al.
patent: 2004/0010341 (2004-01-01), Watts et al.
patent: 2004/0021866 (2004-02-01), Watts et al.
patent: 2004/0022888 (2004-02-01), Sreenivasan et al.
patent: 2004/0029041 (2004-02-01), Shih et al.
patent: 2004/0036201 (2004-02-01), Chou et al.
patent: 2004/0046288 (2004-03-01), Chou
patent: 2004/0081798 (2004-04-01), Lee et al.
patent: 2004/0124566 (2004-07-01), Sreenivasan et al.
patent: 2004/0149367 (2004-08-01), Olsson et al.
patent: 2004/0169003 (2004-09-01), Lee et al.
patent: 2004/0192041 (2004-09-01), Jeong et al.
patent: 2004/0200411 (2004-10-01), Willson et al.
patent: 2004/0209470 (2004-10-01), Bajorek
patent: 2004/0219249 (2004-11-01), Chung et al.
patent: 2004/0219461 (2004-11-01), Chung et al.
patent: 2005/0039618 (2005-02-01), Heidari et al.
patent: 2005/0064054 (2005-03-01), Kasumi
patent: 2005/0098534 (2005-05-01), Sreenivasan et al.
patent: 2005/0270312 (2005-12-01), Lad et al.
patent: 2005/0276919 (2005-12-01), Truskett et al.
patent: 05-080530 (1993-04-01), None
patent: 2003-142399 (2003-05-01), None
patent: WO 00/39829 (2000-07-01), None
patent: WO 01/79591 (2001-10-01), None
patent: WO 01/79592 (2001-10-01), None
patent: WO 2004/103666 (2004-12-01), None
Stephen Y. Chou, et al., “Nanoimprint Lithography”, J. Vac. Sci. Technol. B 14(6), Nov./Dec. 1996, pp. 4129-4133.
Heon Lee, et al., “Full Wafer Scale Near Zero Residual Nano-Imprinting Lithography Using UV Curable Monomer Solution”, Microelectronic Engineering 77 (2005) pp. 42-47.
Notice of Reasons for Rejection for Japanese Patent Application No. 2006-059050 dated Jun. 10, 2009.
Kolesnychenko Aleksey Yurievich
Loopstra Erik Roelof
Van Santen Helmar
ASML Netherlands B.V.
Hoover Matthew
Nguyen Khanh
Pillsbury Winthrop Shaw & Pittman LLP
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