Imprint lithography

Details Imprint lithography Imprint lithography

2011-08-23

2011-08-23

Tadesse, Yewebdar T (Department: 1713)

Coating apparatus

Projection or spray type

Plural projectors

C118S313000, C118S323000, C118S304000, C118S305000, C118S211000, C118S712000, C118S713000

Reexamination Certificate

active

08001924

ABSTRACT:
An imprint lithography apparatus is disclosed. The apparatus has a substrate table configured to support a lithographic substrate and a plurality of nozzles arranged to eject fluid onto the lithographic substrate, the plurality of nozzles extending over a distance which is substantially equal to or greater than a width of the substrate, wherein the nozzles, the lithographic substrate, or both, are moveable relative to the other.

REFERENCES:
patent: 6482742 (2002-11-01), Chou
patent: 6646662 (2003-11-01), Nebashi et al.
patent: 2003/0189604 (2003-10-01), Bae et al.
patent: 2004/0008334 (2004-01-01), Sreenivasan et al.
patent: 2004/0124566 (2004-07-01), Sreenivasan et al.
patent: 2004/0183851 (2004-09-01), Nakamura
patent: 2004/0250760 (2004-12-01), Goto
patent: 2005/0112294 (2005-05-01), Masuda et al.
patent: 2005/0255249 (2005-11-01), Schlatterbeck et al.
patent: 2005/0270312 (2005-12-01), Lad et al.
patent: 04-315915 (1992-11-01), None
patent: 2003-090709 (2003-03-01), None
patent: 2003-249440 (2003-09-01), None
patent: 2003-251792 (2003-09-01), None
patent: 2004-337709 (2004-02-01), None
patent: 2004-255316 (2004-09-01), None
patent: 2004-358353 (2004-12-01), None
patent: 2005-014453 (2005-01-01), None
patent: 2005-137971 (2005-06-01), None
patent: 2006-051708 (2006-02-01), None
patent: 2004/070809 (2004-08-01), None
patent: 2005/120834 (2005-12-01), None
J. Haisma, et al., “Mold-Assisted Nonolithography: A Process for Reliable Pattern Replication”, J. Vac. Sci. Technology, B 14(6), Nov./Dec. 1996.
Notice of Reasons for Rejection for Japanese Patent Application No. 2007-075869 dated Feb. 5, 2010.
Office Action mailed Aug. 5, 2010 from the Japanese Patent Office for the related Japanese Patent Application No. 2010-105276.

Affiliated with

Also associated with

Rating

Imprint lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Imprint lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Imprint lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2652594