Imprint lithography

Plastic and nonmetallic article shaping or treating: processes – With step of making mold or mold shaping – per se – Utilizing surface to be reproduced as an impression pattern

Reexamination Certificate

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Details

C264S226000, C264S220000, C430S022000

Reexamination Certificate

active

07862756

ABSTRACT:
A method of making a substantial replica of a first imprint template which bears a first pattern is disclosed. The method includes filling recesses of the first pattern with a first material, removing the first material from the first imprint template to form a second imprint template which bears a second pattern, the second pattern being the substantial inverse of the first pattern, filling recesses of the second pattern with a photo-curable medium, curing the photo-curable medium by illuminating it with radiation, and removing the cured medium from the second imprint template to form a third imprint template which bears a pattern that is a substantial replica of the first pattern.

REFERENCES:
patent: 4988741 (1991-01-01), Stein
patent: 5346654 (1994-09-01), Kodaka et al.
patent: 6482742 (2002-11-01), Chou
patent: 2001/0007682 (2001-07-01), Chiu et al.
patent: 2004/0245669 (2004-12-01), Nishi et al.
patent: 2005/0230882 (2005-10-01), Watts et al.
patent: 2005/0253296 (2005-11-01), Landis et al.
patent: 2006/0040058 (2006-02-01), Heidari et al.
patent: 2006/0279025 (2006-12-01), Heidari et al.
patent: 2003-276030 (2003-09-01), None
patent: 2004-288845 (2010-08-01), None
patent: 2004/090636 (2004-10-01), None
Office Action in related Japanese Application No. 2007-075810 mailed May 24, 2010.

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