Imprint apparatus, imprint method, and mold for imprint

Plastic article or earthenware shaping or treating: apparatus – Means applying electrical or wave energy directly to work – Radiated energy

Reexamination Certificate

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C264S040100

Reexamination Certificate

active

08047828

ABSTRACT:
An imprint apparatus for imprinting a pattern provided to a mold onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.

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Stephan Y. Chou et al., “Imprint of Sub-25 nm Vias and Trenches in Polymers,” 67(21) Appl. Phys. Lett., 3114-16 (1995).

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