Implanting impurities in semiconductors and semiconductor implan

Details Implanting impurities in semiconductors and semiconductor implan Implanting impurities in semiconductors and semiconductor implan

1991-08-26

1994-03-15

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437912, 437934, 148DIG56, 148DIG83, 148DIG84, H01L 21265

Patent

active

052945570

ABSTRACT:
A method for ion-implanting a dopant species in semiconductors includes the steps of implanting a dopant species in a semiconductor material at a predetermined rate, the predetermined rate being based on a rate corresponding to a maximum in a characteristic graph of percent activation as a function of dopant species implantation rate; and annealing the dopant implanted semiconductor.

REFERENCES:
patent: 4033788 (1977-07-01), Hunsperger et al.
patent: 4396437 (1983-08-01), Kwok et al.
patent: 4472206 (1984-09-01), Hodgson et al.
patent: 4558509 (1985-12-01), Tiwari
patent: 4576652 (1986-03-01), Hovel et al.
patent: 4615766 (1986-10-01), Jackson et al.
patent: 4743569 (1988-05-01), Plumton et al.
patent: 4820651 (1989-04-01), Prince et al.
patent: 4879259 (1989-11-01), Reynolds et al.
Kamalov et al., "Electrical Activity of Silicon in Gallium Arsenide," Sov. hys. Semicond. 12(3), Mar. 1978, pp. 340-341.
Masuyama et al., "Steady State Thermally Annealed GaAs with Room-Temperature-Implanted Si," Appl. Phys. Ltt. 36(9), May 1980, pp. 749-751.
Kuzuhara et al., "Infrared Rapid Thermal Annealing of Si-Implanted GaAs," Appl. Phys. Lett 41(8), Oct. 1982, pp. 755-758.
Moore et al., "Silicon Implantation into GaAs: Observations of Dose Rate Dependent Electrical Activation and Damage," Appl. Phys. Lett. 57(9) Aug. 1990, pp. 911-913.

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