Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Reexamination Certificate
2007-01-09
2009-06-16
Culbert, Roberts (Department: 1792)
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
C427S002260
Reexamination Certificate
active
07547399
ABSTRACT:
The surface of a device that is surgically implantable in living bone is prepared. The device is made of titanium with a native oxide layer on the surface. The method of preparation comprises the steps of removing the native oxide layer from the surface of the device and performing further treatment of the surface substantially in the absence of unreacted oxygen.
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Culbert Roberts
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