Implant-controlled-channel vertical JFET

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Combined with field effect transistor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S135000

Reexamination Certificate

active

06909125

ABSTRACT:
We disclose the structure of an electronic device, the method of making the device and the operation of the device. The device is built near the top of a substrate. It has, near the top surface, a buried layer that is electrically communicable to a drain terminal. The device has a body region over the buried layer. A portion of the body region contacts a gate region connected to a gate terminal. The device has a channel region, of which the length spans the distance between the buried layer and a source region, which projects upward from the channel region and is connected to a source terminal. The device current flows in the channel substantially perpendicularly to the top surface of the substrate.

REFERENCES:
patent: 6049108 (2000-04-01), Williams et al.
patent: 6392271 (2002-05-01), Alavi et al.
patent: 6518112 (2003-02-01), Armacost et al.
patent: 6825531 (2004-11-01), Mallikarjunaswamy
Pending U.S. Appl. No. 10/678,028 (TI-33654), Pendharkar et al. “A Low Noise Vertical Variable Gate Control Voltage JFET Device in a BICMOS Process & Methods to Build this Device”.
Pending U.S. Appl. No. 10/623,230 (TI-35213), Howard et al. “Double Diffused Vertical JFET”.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Implant-controlled-channel vertical JFET does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Implant-controlled-channel vertical JFET, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Implant-controlled-channel vertical JFET will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3462815

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.