Immersion-type apparatus for processing substrates

Details Immersion-type apparatus for processing substrates Immersion-type apparatus for processing substrates

1994-12-05

1996-07-30

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With non-impelling fluid deflector or baffle other than...

134902, B08B 304

Patent

active

055402470

ABSTRACT:
A holding rod is disposed in a processing bath close to the bottom of the processing bath. The holding rod is located in a bottom center portion of the processing bath between two processing fluid supply pipes. Since the holding rod serves as diaphragm means, a processing fluid from outlet holes rushing toward the bottom center portion of the processing bath along the bottom of the processing bath hits the holding rod, changes its direction upward and starts uniformly circulating in the processing bath.

REFERENCES:
patent: 1436700 (1922-11-01), Eliel
patent: 2603460 (1952-07-01), Kalinske
patent: 3648985 (1972-03-01), Matweecha
patent: 4092176 (1978-05-01), Kozai et al.
patent: 5186192 (1993-02-01), Netsu et al.

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