Immersion photolithography system and method using inverted...

Details Immersion photolithography system and method using inverted... Immersion photolithography system and method using inverted...

2005-12-27

2005-12-27

Epps, Georgia (Department: 2873)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C359S016000, C359S656000, C359S649000

Reexamination Certificate

active

06980277

ABSTRACT:
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides a liquid between the projection optical system and the substrate. The projection optical system is positioned below the substrate.

REFERENCES:
patent: 5691802 (1997-11-01), Takahashi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 2002/0008862 (2002-01-01), Kobayashi
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 4305915 (1992-10-01), None
patent: 10255139 (1992-10-01), None
patent: 302658 (1971-06-01), None
English Translation Abstract of JP 10253319 A.
English Translation Abstract of JP 4305915 A.
English Translation Abstract of SU 302685 A.
Copy Search Report for Singapore Appln. No. 200403822-0, issued Nov. 28, 2004, 5 pages.

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