Immersion photolithography system and method using...

Details Immersion photolithography system and method using... Immersion photolithography system and method using...

2005-03-15

2005-03-15

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S067000

Reexamination Certificate

active

06867844

ABSTRACT:
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.

REFERENCES:
patent: 3648587 (1972-03-01), Stevens
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 6721031 (2004-04-01), Hasegawa et al.
patent: 20040075895 (2004-04-01), Lin

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