Immersion photolithography system and method using...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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C355S053000

Reexamination Certificate

active

08004649

ABSTRACT:
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.

REFERENCES:
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 3648587 (1972-03-01), Stevens
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4390273 (1983-06-01), Loebach et al.
patent: 4396705 (1983-08-01), Akeyama et al.
patent: 4405701 (1983-09-01), Banks et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5040020 (1991-08-01), Rauschenbach et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 5900354 (1999-05-01), Batchelder
patent: 5994430 (1999-11-01), Ding et al.
patent: 6191429 (2001-02-01), Suwa
patent: 6236634 (2001-05-01), Lee et al.
patent: 6368683 (2002-04-01), Shirasaki
patent: 6560032 (2003-05-01), Hatano
patent: 6600547 (2003-07-01), Watson et al.
patent: 6603130 (2003-08-01), Bisschops et al.
patent: 6633365 (2003-10-01), Suenaga
patent: 6649093 (2003-11-01), Van Santen et al.
patent: 6721031 (2004-04-01), Hasegawa et al.
patent: 6721035 (2004-04-01), Segers et al.
patent: 6781670 (2004-08-01), Krautschik
patent: 6788477 (2004-09-01), Lin
patent: 6809794 (2004-10-01), Sewell
patent: 6844206 (2005-01-01), Phan et al.
patent: 6844919 (2005-01-01), Suenaga
patent: 6867844 (2005-03-01), Vogel et al.
patent: 7411650 (2008-08-01), Vogel et al.
patent: 2002/0020821 (2002-02-01), Van Santen et al.
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2003/0123040 (2003-07-01), Almogy
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2004/0000627 (2004-01-01), Schuster
patent: 2004/0021844 (2004-02-01), Suenaga
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0103950 (2004-06-01), Iriguchi
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2004/0114117 (2004-06-01), Bleeker
patent: 2004/0118184 (2004-06-01), Violette
patent: 2004/0119954 (2004-06-01), Kawashima et al.
patent: 2004/0125351 (2004-07-01), Krautschik
patent: 2004/0135099 (2004-07-01), Simon et al.
patent: 2004/0136494 (2004-07-01), Lof et al.
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2004/0169834 (2004-09-01), Richter et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2004/0211920 (2004-10-01), Mari Derksen et al.
patent: 2004/0233405 (2004-11-01), Kato et al.
patent: 2004/0239954 (2004-12-01), Bischoff
patent: 2004/0257544 (2004-12-01), Vogel et al.
patent: 2004/0263808 (2004-12-01), Sewell
patent: 2004/0263809 (2004-12-01), Nakano
patent: 2005/0002004 (2005-01-01), Kolesnychenko et al.
patent: 2005/0007569 (2005-01-01), Streefkerk et al.
patent: 2005/0007570 (2005-01-01), Streefkerk et al.
patent: 2005/0018155 (2005-01-01), Cox et al.
patent: 2005/0018156 (2005-01-01), Mulkens et al.
patent: 2005/0018208 (2005-01-01), Levinson
patent: 2005/0024609 (2005-02-01), De Smit et al.
patent: 2005/0030498 (2005-02-01), Mulkens
patent: 2005/0030501 (2005-02-01), Mulkens et al.
patent: 2005/0030506 (2005-02-01), Schuster
patent: 2005/0036121 (2005-02-01), Hoogendam et al.
patent: 2005/0036183 (2005-02-01), Yeo et al.
patent: 2005/0036184 (2005-02-01), Yeo et al.
patent: 2005/0037269 (2005-02-01), Levinson
patent: 2005/0046934 (2005-03-01), Ho et al.
patent: 2005/0048223 (2005-03-01), Pawloski et al.
patent: 2005/0078286 (2005-04-01), Dierichs et al.
patent: 2005/0078287 (2005-04-01), Sengers et al.
patent: 2005/0168713 (2005-08-01), Vogel et al.
patent: 2005/0231695 (2005-10-01), Wang et al.
patent: 2006/0023183 (2006-02-01), Novak et al.
patent: 206607 (1984-02-01), None
patent: 221563 (1985-04-01), None
patent: 224448 (1985-07-01), None
patent: 242880 (1987-02-01), None
patent: 0023231 (1981-02-01), None
patent: 0418427 (1991-03-01), None
patent: 0 834 773 (1998-04-01), None
patent: 1039511 (2000-09-01), None
patent: 1 420 298 (2004-05-01), None
patent: 1 571 698 (2005-09-01), None
patent: 1 628 330 (2006-02-01), None
patent: 2474708 (1981-07-01), None
patent: 58-202448 (1983-11-01), None
patent: 62-065326 (1987-03-01), None
patent: 62-121417 (1987-06-01), None
patent: 63-157419 (1988-06-01), None
patent: 04-305915 (1992-10-01), None
patent: 04-305917 (1992-10-01), None
patent: 06-124873 (1994-05-01), None
patent: 07-132262 (1995-05-01), None
patent: 07-220990 (1995-08-01), None
patent: 10-228661 (1998-08-01), None
patent: 10-255319 (1998-09-01), None
patent: 10-303114 (1998-11-01), None
patent: 10-303114 (1998-11-01), None
patent: 10-340846 (1998-12-01), None
patent: 11-176727 (1999-07-01), None
patent: 2000-058436 (2000-02-01), None
patent: 2001-091849 (2001-04-01), None
patent: 2004-193252 (2004-07-01), None
patent: 513617 (2002-12-01), None
patent: 530193 (2003-05-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 03/077036 (2003-09-01), None
patent: WO 03/077037 (2003-09-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/053596 (2004-06-01), None
patent: WO 2004/053950 (2004-06-01), None
patent: WO 2004/053951 (2004-06-01), None
patent: WO 2004/053952 (2004-06-01), None
patent: WO 2004/053953 (2004-06-01), None
patent: WO 2004/053954 (2004-06-01), None
patent: WO 2004/053955 (2004-06-01), None
patent: WO 2004/053956 (2004-06-01), None
patent: WO 2004/053957 (2004-06-01), None
patent: WO 2004/053958 (2004-06-01), None
patent: WO 2004/053959 (2004-06-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/057295 (2004-07-01), None
patent: WO 2004/057589 (2004-07-01), None
patent: WO 2004-057590 (2004-07-01), None
patent: WO 2004/086468 (2004-10-01), None
patent: WO 2004/086470 (2004-10-01), None
patent: WO 2004/090577 (2004-10-01), None
patent: WO 2004/090633 (2004-10-01), None
patent: WO 2004/090634 (2004-10-01), None
patent: WO 2004/090956 (2004-10-01), None
patent: WO 2004/092830 (2004-10-01), None
patent: WO 2004/092833 (2004-10-01), None
patent: WO 2004/093130 (2004-10-01), None
patent: WO 2004/093159 (2004-10-01), None
patent: WO 2004/093160 (2004-10-01), None
patent: WO 2004/095135 (2004-11-01), None
patent: WO 2004/097911 (2004-11-01), None
patent: WO 2004/102646 (2004-11-01), None
patent: WO 2004/105106 (2004-12-01), None
patent: WO 2004/105107 (2004-12-01), None
patent: WO 2004/107011 (2004-12-01), None
patent: WO 2004/107417 (2004-12-01), None
patent: WO 2004/112108 (2004-12-01), None
patent: WO 2004/114380 (2004-12-01), None
patent: WO 2005/015315 (2005-02-01), None
patent: WO 2005/022616 (2005-03-01), None
patent: WO 2005/036623 (2005-04-01), None
patent: WO 2005/062351 (2005-07-01), None
Search report from Singapore Patent Appl. No. SG 200403797-4, 4 pages, mailing date Feb. 25, 2005.
U.S. Appl. No. 10/367,910, filed Feb. 19, 2003, entitled “Projection exposure apparatus and method with workpiece area detection,” to Kyoichi Suwa.
U.S. Appl. No. 11/122,215, filed May 5, 2005, entitled “Projection exposure apparatus and method with workpiece area detection,” to Kyoichi Suwa.
“Depth-of-Focus Enhancement Using High Refractive Index Layer on the Imaging Layer”, IBM Technical Disclosure Bulletin, vol. 27, No. 11, Apr. 1985, p. 6521.
Hata, H., “The Development of Immersion Exposure Tools”, Litho Forum, International Sematech, Los Angeles, Jan. 27-29, 2004.
Hoffnagle, J.A. et al., “Liquid Immersion Deep-Ultraviolet Interferometric Lithography”, J. Vac. Sci. Technol. B., vol. 17, No. 6, Nov./Dec. 1999, pp. 3306-3309.
Hogan, H., “New Semiconductor Lithography Makes a Splash”, Photonics Technology World, Photonics Spectra, Oct. 2003.
Kawata, H. et al., “Fabrication of 0.2μm Fin

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