Immersion lithography fluid control system that applies...

Details Immersion lithography fluid control system that applies... Immersion lithography fluid control system that applies...

2005-09-29

2008-03-04

Lee, Diane I. (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S067000, C359S665000

Reexamination Certificate

active

07339650

ABSTRACT:
A fluid control system for immersion lithography that uses an optical member such as a lens, a workpiece such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, includes a fluid-supplying device for providing an immersion fluid such as water to a specified exposure area in the gap, and a fluid control device that activates a force on the fluid so that the immersion fluid is retained in the exposure area and its vicinity at least while the immersion lithography operation is being carried out. A pressured gas may be caused to apply a hydrodynamic force on the fluid to keep it in its place.

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