Immersion exposure technique

Details Immersion exposure technique Immersion exposure technique

2004-06-22

2008-03-25

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S055000, C355S072000

Reexamination Certificate

active

07349064

ABSTRACT:
An exposure apparatus having a projection optical system configured to project a pattern of an original to a substrate and exposing a substrate to light via the original with a gap between the substrate and the projection optical system being filled with liquid. The apparatus includes a substrate stage configured to hold the substrate and to move, a supply nozzle configured to supply the liquid to the gap between the substrate and the projection optical system, the supply nozzle entirely surrounding the projection optical system, and a recovery nozzle arranged outside the supply nozzle and configured to recover the liquid from the gap, the recovery nozzle entirely surrounding said supply nozzle.

REFERENCES:
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5332977 (1994-07-01), Fritsche et al.
patent: 5550633 (1996-08-01), Kamiya
patent: 5610683 (1997-03-01), Takahashi
patent: 6101952 (2000-08-01), Thornton et al.
patent: 6665046 (2003-12-01), Nogawa et al.
patent: 6734950 (2004-05-01), Nakano
patent: 6757048 (2004-06-01), Arakawa
patent: 7268854 (2007-09-01), Nagasaka
patent: 2001/0028443 (2001-10-01), Yabu
patent: 2002/0020821 (2002-02-01), Van Santen et al.
patent: 2002/0057425 (2002-05-01), Nakano
patent: 2002/0122162 (2002-09-01), Nakauchi et al.
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2004/0257544 (2004-12-01), Vogel et al.
patent: 2005/0259234 (2005-11-01), Hirukawa et al.
patent: 2006/0023183 (2006-02-01), Novak et al.
patent: 2006/0023186 (2006-02-01), Binnard
patent: 2006/0028632 (2006-02-01), Hazelton et al.
patent: 2006/0033894 (2006-02-01), Binnard
patent: 2006/0077367 (2006-04-01), Kobayashi et al.
patent: 2006/0114445 (2006-06-01), Ebihara
patent: 2007/0064210 (2007-03-01), Kobayashi et al.
patent: 2007/0132968 (2007-06-01), Kobayashi et al.
patent: 1 571 698 (2005-09-01), None
patent: 63-20014 (1988-01-01), None
patent: 6-6248 (1994-01-01), None
patent: 06-124873 (1994-05-01), None
patent: 6-124873 (1994-05-01), None
patent: 2001-527380 (2001-12-01), None
patent: 2004-207711 (2004-07-01), None
patent: 2005-012228 (2005-01-01), None
patent: 2005-109426 (2005-04-01), None
patent: 2005-277363 (2005-10-01), None
patent: WO 99/33691 (1999-07-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 2004/053955 (2004-06-01), None
patent: WO 2004/090577 (2004-10-01), None
patent: WO 2004/092830 (2004-10-01), None
patent: WO 2004/114380 (2004-12-01), None
Japanese Office Action dated Aug. 5, 2005, issued in corresponding Japanese patent application No. 2003-185389.
Japanese Office Action dated Feb. 5, 2007, issued in corresponding Japanese patent application No. 2002-296302, with English translation.
U.S. Appl. No. 60/462,786, filed Apr. 11, 2003, Novak et al.
U.S. Appl. No. 60/462,499, filed Apr. 11, 2003, Binnard.
U.S. Appl. No. 60/462,112, filed Apr. 10, 2003, Hazelton et al.

Affiliated with

Also associated with

Rating

Immersion exposure technique does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Immersion exposure technique, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Immersion exposure technique will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3971536