Immersion exposure apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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Reexamination Certificate

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07990518

ABSTRACT:
An immersion exposure apparatus that projects a pattern of an original onto a substrate via a projection optical system and a liquid, thereby exposing the substrate. A substrate stage mechanism includes a substrate stage to hold the substrate. An immersion unit supplies the liquid into a space between the substrate or the substrate stage and the projection optical system, and recovers the liquid from above the substrate or the substrate stage. A control unit controls the immersion unit to recover the liquid from above the substrate or the substrate stage, and then controls the substrate stage mechanism to move the substrate stage to a retreat position, in response to a shutoff request for requesting shutoff of electrical power supply to the substrate stage mechanism. The control unit executes, in response to the shutoff request, a special process according to a process being executed by the immersion exposure apparatus when the control unit has received the shutoff request, and then controls the immersion unit to recover the liquid from above the substrate stage.

REFERENCES:
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 7505115 (2009-03-01), Magome et al.
patent: 2005/0243293 (2005-11-01), Hara et al.
patent: 2006/0132737 (2006-06-01), Magome et al.
patent: 2006/0146305 (2006-07-01), Magome et al.
patent: 2006/0209280 (2006-09-01), Makita et al.
patent: 2007/0076183 (2007-04-01), Hara et al.
patent: 2007/0164234 (2007-07-01), Tsuji et al.
patent: 2005-79480 (2005-03-01), None
patent: 2005-268742 (2005-09-01), None
patent: 2006-179761 (2006-07-01), None
patent: 2006-319242 (2006-11-01), None
patent: 10-2006-0052882 (2006-05-01), None
patent: WO 2005/022615 (2005-03-01), None
patent: WO 2005/069355 (2005-07-01), None
English translation of Japanese Patent Laid-Open No. 2006-179761.
English translation of Japanese Patent Laid-Open No. 2005-79480.
English translation of Japanese Patent Laid-Open No. 2006-319242.
Korean Office Action dated Jul. 8, 2010, which issued in counterpart Korean patent application No. 10-2008-0096941.

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