Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing
Reexamination Certificate
2011-03-15
2011-03-15
Gonzalez, Porfirio Nazario (Department: 1621)
Organic compounds -- part of the class 532-570 series
Organic compounds
Heavy metal containing
C427S248100, C427S250000
Reexamination Certificate
active
07906668
ABSTRACT:
Objects of the present invention are to provide a novel niobium or tantalum complex having good vapor pressure and becoming a raw material for producing a niobium- or tantalum-containing thin film by a method such as CVD method, ALD method or the like, a method for producing the same, a metal-containing thin film using the same, and a method for producing the same. The present invention relates to producing an imide complex represented by the general formula (1) by, for example, the reaction between M1(NR1)X3(L)r(2) and an alkali metal alkoxide (3):(wherein M1represents niobium atom or tantalum atom, R1represents an alkyl group having from 1 to 12 carbon atoms, R2represents an alkyl group having from 2 to 13 carbon atoms, X represents halogen atom, r is 1 when L is 1,2-dimethoxyethane ligand, r is 2 when L is pyridine ligand, and M2represents an alkali metal), and producing a niobium- or tantalum-containing thin film by using the imide complex (1) as a raw material.
REFERENCES:
patent: 2003-335740 (2003-11-01), None
patent: 2006-131606 (2006-05-01), None
patent: 2006049059 (2006-05-01), None
Hsin-Tien Chiu et al., Syntheses and Characterization of Organoimido Complexes of Niobium(V); Potential CVD Precursors, Journal of the Chinese Chemical Society, 1998, pp. 355-360, vol. 45, No. 3.
Kaupo Kukli et al., Atomic Layer Deposition and Chemical Vapor Deposition of Tantalum Oxide by Successive and Simultaneous Pulsing of Tantalum Ethoxide and Tantalum Chloride, Chemistry of Materials, 2000, pp. 1914-1920, vol. 12 No. 7, American Chemical Society.
William A. Nugent et al., Electrophilic vs. Nucleophilic Reactivity in Complexes Containing Multiply-Bonded (Alkylidene, Imido or Oxo) Ligands. A Conceptual Model, Inorganica Chimica Acta 65, 1982, pp. L91-L93.
Chiba Hirokazu
Furukawa Taishi
Inaba Koichiro
Oshima Noriaki
Tada Ken-ichi
Gonzalez Porfirio Nazario
Sagami Chemical Research Center
Sughrue & Mion, PLLC
Tosoh Corporation
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