Optical: systems and elements – Diffraction – From grating
Reexamination Certificate
2005-05-17
2005-05-17
Assaf, Fayez G. (Department: 2872)
Optical: systems and elements
Diffraction
From grating
C359S572000, C359S570000, C359S574000, C378S043000
Reexamination Certificate
active
06894837
ABSTRACT:
Imaging system for a microscope based on extreme ultraviolet (EUV) radiation. The present invention is directed to a reflective imaging system for an x-ray microscope for examining and object in an object plane, wherein the object is illuminated by rays of a wavelength of less than 100 nm, particularly less than 30 nm, and is imaged in a magnified manner in an image plane. In the imaging system, according to the invention, for a microscope based on extreme ultraviolet (EUV) radiation with wavelengths in the range of less than 100 nm, with a magnification of 0.1× to 1000× and a structural length of less than 5 m, at least one of the imaging optical elements2and3in the beam path has a diffractive-reflective structure which is arranged on a spherical or plane area and has a non-rotationally symmetric, asymmetric shape. The arrangement according to the invention provides an imaging system which avoids the disadvantages of the prior art and ensures a high imaging quality. The manufacturing cost remains reasonable due to the exclusive use of spherical mirrors.
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Article entitled: “High Energy X-Ray Phase Contrast Microscopy Using A Circular Bragg-Fresnel Lens” Optics Communications, North-Holland Publishing Co. Amsterdam, NL, Bd. 135, Nr. 4, Feb. 15, 1997.
Brunner Robert
Dobschal Hans-Juergen
Greif-Wuestenbecker Joern
Rosenkranz Norbert
Scheruebl Thomas
Assaf Fayez G.
Carl Zeiss Microelectric Systems GmbH
Reed Smith LLP
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