Imaging system and apparatus for ultraviolet lithography

Details Imaging system and apparatus for ultraviolet lithography Imaging system and apparatus for ultraviolet lithography

1997-02-21

1998-05-26

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

G02B 518

Patent

active

057570175

ABSTRACT:
An imaging system with at least one reflective surface for forming an image by means of ultraviolet radiation, the reflective surface being provided with a correction layer which is transparent to the wavelength of the radiation used. This layer compensates for phase differences caused by deviations of form of the reflective surfaces. The correction layer has a refractive index which differs only slightly from 1, so that the requirements imposed as regards the precision of the surface of the transparent layer are significantly less severe than for the reflective layer.

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patent: 5420436 (1995-05-01), Seya et al.
patent: 5510230 (1996-04-01), Tennant et al.
Edited by E.D. Palik, "Handbook of Optical constants of Solids", Academic Press Inc., 1985, pp. 451-464.
E. Spiller et al, "Controlled fabrication of multilayer soft-x-ray mirrors", Appl. Phys. Lett. 37(11), 1 Dec. 1980, pp. 1048-1050.

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