Photocopying – Projection printing and copying cameras – Step and repeat
Patent
1997-05-16
2000-07-04
Metjahic, Safet
Photocopying
Projection printing and copying cameras
Step and repeat
355 67, G03B 2742
Patent
active
060846550
ABSTRACT:
An imaging method for imaging a fine pattern having linear features extending along orthogonal first and second directions is disclosed, which method is characterized by: providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.
REFERENCES:
patent: 3729252 (1973-04-01), Nelson
patent: 3776633 (1973-12-01), Frosch, et al.
patent: 3887816 (1975-06-01), Colley
patent: 4497015 (1985-01-01), Konno et al.
patent: 4521082 (1985-06-01), Suzuki et al.
patent: 4619508 (1986-10-01), Shibuya et al.
patent: 4634240 (1987-01-01), Suzuki et al.
patent: 4645924 (1987-02-01), Suzuki et al.
patent: 4789222 (1988-12-01), Ota et al.
patent: 4924257 (1990-05-01), Jain
patent: 4931830 (1990-06-01), Suwa et al.
patent: 4947030 (1990-08-01), Takahashi
patent: 4970546 (1990-11-01), Suzuki et al.
patent: 4988188 (1991-01-01), Ohta
patent: 5061956 (1991-10-01), Takubo et al.
patent: 5144362 (1992-09-01), Kamon et al.
patent: 5153419 (1992-10-01), Takahashi
patent: 5237367 (1993-08-01), Kudo
patent: 5245384 (1993-09-01), Mori
patent: 5251067 (1993-10-01), Kamon
patent: 5253040 (1993-10-01), Kamon et al.
patent: 5264898 (1993-11-01), Kamon et al.
patent: 5286963 (1994-02-01), Torigoe
patent: 5287142 (1994-02-01), Kamon
patent: 5296892 (1994-03-01), Mori
patent: 5673102 (1997-09-01), Suzuki et al.
Victor Pol, et al., "Excimer Laser Based Lithography: A Deep-Ultraviolet Wafer Stepper for VLSI Processing", Optical Engineering, vol. 26, No. 4, pp. 311-318, Apr. 1987.
S.T. Yang, et al., "Effect of Central Obscuration on Image Formation in Projection Lithography", SPIE vol. 1264 Optical/Laser Microlithography III, pp. 477-485,m 1990.
Hecht & Zajac, Optics, 1st Edition, p. 117, 1974.
Int. Cl., 5th Edition, vol. 7, Section G, pp. 68 and 72, 1989.
E. Glatzel, "New Lenses for Microlithography", SPIE, vol. 237, p. 310, International Lens Design Conference (OSA), 1980.
Affidavit of Robert E. Fischer in the opposition to EP 0183827 by Canon KK, 1994.
Robertson, et al., "Proximity effects and influences of nonuniform illumination in projection lithography", SPIE, vol. 334, Optical Microlithography-Technology for the Mid-1980s (1982), pp. 37-43.
Basic and Application of Optical System Theory (7th), Jan. 11 and 12, 1991, SEIKEN Seminar Text, Course 161, pp. 45 to 48.
Rosenbluth, et al., "A critical examination of submicron optical lithography using simulated projection images", J. Vac. Sci. Technol., B1(4), Oct.-Dec. 1983, pp. 1190-1195.
Jeanne Roussel, "Step-and-Repeat Wafer Imaging", Solid State Technology, May 1978, pp. 67-71.
Noguchi Miyoko
Suzuki Akiyoshi
Canon Kabushiki Kaisha
Dalakis Michael
Metjahic Safet
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