Imaging elements adhesion promoting subbing layer for phototherm

Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430531, 430533, 430617, 430619, 430631, G03C 1498, G03C 176

Patent

active

061625973

ABSTRACT:
A polyester support having an adjacent subbing layer which comprises a polymer or copolymer of glycidyl acrylate and/or glycidyl methacrylate improves the adhesion of a photothermographic imaging layer containing a poly(vinyl butyral) binder coated from an organic solvent. The subbing layer can be applied in the form of an aqueous dispersion in the prescence of a coalescing agent. Such a subbing layer does not adversely affect sensitometry in a photothermographic or thermographic element.

REFERENCES:
patent: 3501301 (1970-03-01), Nadeau et al.
patent: 3645740 (1972-02-01), Nishio et al.
patent: 4098952 (1978-07-01), Kelly et al.
patent: 4128426 (1978-12-01), Ohta et al.
patent: 4328283 (1982-05-01), Nakadate et al.
patent: 4609617 (1986-09-01), Yamazaki et al.
patent: 5618657 (1997-04-01), Rieger et al.
patent: 5677116 (1997-10-01), Zengerle et al.
patent: 5718981 (1998-02-01), Fleischer et al.
patent: 5968646 (1999-10-01), Grace et al.
Research Disclosure, Item No. 18358, Jul. 1979.
Japanese Patent Abstract 5134356 A.
Japanese Patent Abstract 59094756 A.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Imaging elements adhesion promoting subbing layer for phototherm does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Imaging elements adhesion promoting subbing layer for phototherm, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Imaging elements adhesion promoting subbing layer for phototherm will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-269986

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.