Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Antihalation or filter layer containing
Patent
1998-08-27
2000-06-27
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Antihalation or filter layer containing
430201, 430536, 430538, 430551, 347106, 428513, 524 99, G03C 179, G03C 1795, G03C 1815, G03C 852
Patent
active
06080534&
ABSTRACT:
The invention relates to an imaging element comprising a substrate having at least two polymer layers on the side bearing an imaging layer wherein at least one of said layers has incorporated therein a stabilizing amount of hindered amine.
REFERENCES:
patent: 4283486 (1981-08-01), Aono et al.
patent: 4352861 (1982-10-01), von Meer et al.
patent: 4377616 (1983-03-01), Ashcraft et al.
patent: 4562145 (1985-12-01), Woodward et al.
patent: 4582785 (1986-04-01), Woodward et al.
patent: 4632869 (1986-12-01), Park et al.
patent: 4758462 (1988-07-01), Park et al.
patent: 5055371 (1991-10-01), Lee et al.
patent: 5100862 (1992-03-01), Harrison et al.
patent: 5141685 (1992-08-01), Maier et al.
patent: 5244861 (1993-09-01), Campbell et al.
patent: 5429916 (1995-07-01), Ohshima et al.
patent: 5514460 (1996-05-01), Surman et al.
patent: 5705326 (1998-01-01), Kawai
patent: 5866282 (1999-02-01), Bourdelais et al.
Aylward Peter T.
Gula Thaddeus S.
Harris Valerie J.
Eastman Kodak Company
Leipold Paul A.
Schilling Richard L.
LandOfFree
Imaging element with a substrate containing hindered amine stabi does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Imaging element with a substrate containing hindered amine stabi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Imaging element with a substrate containing hindered amine stabi will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1782961