Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Patent
1997-05-12
1998-09-08
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
430215, 430263, 430527, 430531, 430534, 430536, 430539, 430961, G03C 1795, G03C 189, G03C 193
Patent
active
058043608
ABSTRACT:
The present invention is an imaging element including a support, an image-forming layer and at one least layer having been formed by the coating and subsequent drying of a coating composition. The coating composition is an aqueous medium having therein a polyurethane/vinyl polymer dispersion formed by free radical polymerization of a vinyl monomer in the presence of an aqueous polyurethane dispersion.
REFERENCES:
patent: 4497917 (1985-02-01), Upson et al.
patent: 4644030 (1987-02-01), Loewrigkeit et al.
patent: 4880867 (1989-11-01), Gobel et al.
patent: 4927876 (1990-05-01), Coogan et al.
patent: 4934559 (1990-06-01), Putnam
patent: 5006413 (1991-04-01), Den Hartog et al.
patent: 5006451 (1991-04-01), Anderson et al.
patent: 5204404 (1993-04-01), Werner et al.
patent: 5314942 (1994-05-01), Coogan et al.
patent: 5366855 (1994-11-01), Anderson et al.
patent: 5371133 (1994-12-01), Stanley
patent: 5447832 (1995-09-01), Wang et al.
patent: 5695920 (1997-12-01), Anderson et al.
Anderson Charles C.
Schell Brian A.
Tingler Kenneth L.
Wang Yongcai
Eastman Kodak Company
Ruoff Carl F.
Schilling Richard L.
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