Imaging base with backside roughness at two frequencies

Details Imaging base with backside roughness at two frequencies Imaging base with backside roughness at two frequencies

1998-10-30

2000-10-17

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Structurally defined

430536, 430538, 430950, 347106, 503227, G03C 1765

Patent

active

061329428

ABSTRACT:
The invention relates to imaging elements comprising a back surface wherein said back surface has a low frequency roughness component having a roughness average of between 0.30 and 2.00 .mu.m when measured with a low pass cutoff filter of 500 cycles/mm and a high frequency component having a roughness average of 0.001 to 0.05 .mu.m when measured with a high pass cutoff filter of 500 cycles/mm.

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