Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2002-11-27
2008-05-27
Ahmed, Samir (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C355S053000, C378S034000
Reexamination Certificate
active
07379579
ABSTRACT:
An imaging apparatus having an illuminator configured to condition a beam of radiation having a wavelength equal to or shorter than 365 nm; a support structure to support a programmable patterning device, the programmable patterning device configured to pattern the beam according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a beam splitter located between the programmable patterning device and the substrate table configured to divert aside a portion of the patterned beam; and an image detector configured to analyze the portion of the patterned beam.
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Bleeker Arno Jan
Van Der Mast Karel Diederick
Ahmed Samir
ASML Netherlands B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Rashidian Mehdi
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