Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2004-05-14
2008-10-21
Huff, Mark F. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07438997
ABSTRACT:
Systems and techniques for lithography. In one aspect, a method includes producing a microelectronic device by modulating an intensity and a phase of the zero diffraction order of a radiation with a device including subwavelength features having a pitch dimension smaller than one wavelength of the radiation.
REFERENCES:
patent: 5300786 (1994-04-01), Brunner et al.
patent: 5446521 (1995-08-01), Hainsey et al.
patent: 5541026 (1996-07-01), Matsumoto
patent: 5578402 (1996-11-01), Watanabe
patent: 5633102 (1997-05-01), Toh et al.
patent: 5663102 (1997-09-01), Park
patent: 5840447 (1998-11-01), Peng
patent: 5932376 (1999-08-01), Liu et al.
patent: 6440616 (2002-08-01), Izuha et al.
patent: 6541165 (2003-04-01), Pierrat
patent: 6623895 (2003-09-01), Chen et al.
patent: 6994940 (2006-02-01), Nakao
patent: 7033708 (2006-04-01), Tejnil
patent: 2001/0003026 (2001-06-01), Lin et al.
patent: 2002/0132173 (2002-09-01), Rolfson
patent: 2003/0039893 (2003-02-01), Farnsworth et al.
patent: 2003/0219096 (2003-11-01), Sewell
patent: 2004/0029023 (2004-02-01), Misaka
patent: 0 090 924 (1983-10-01), None
patent: 576947 (2004-02-01), None
patent: WO02/44817 (2002-06-01), None
Gordon, R., et al., “Design and analysis of manufacturable alternating phase-shifting masks”,Proc. SPIE—The International Society for Optical Engineering, vol. 3546, pp. 606-616, 18thAnnual BACUS Symposium on Photomask Technology and Management, Brian J. Grenon; Frank E. Abboud; Eds. (Dec. 1998).
Rieger, M., et al., “Layout design methodologies for sub-wavelength manufacturing”,Proc. 38th Conf. Design Automation, Annual ACM IEEE Design Automation Conference, Las Vegas, NV, USA, pp. 85-88 (2001).
Ronse, K., et al., Semiconductor Fabtech 10th Edition: Resolution Enhancement Techniques in Optical Lithography, pp. 241-244 (Feb. 2005).
Levinson, H.,Principles of Lithography, SPIE—The International Society for Optical Engineering, p. 274, formula 8.18, (2001).
Borodovsky Yan
Tejnil Edita
Fish & Richardson P.C.
Huff Mark F.
Intel Corporation
Ruggles John
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