Imageable members with improved chemical resistance

Radiation imagery chemistry: process – composition – or product th – Imaged product – Multilayer

Reexamination Certificate

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Details

C430S270100, C430S271100, C430S302000, C430S326000, C430S905000, C430S910000, C430S964000

Reexamination Certificate

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11393156

ABSTRACT:
Single-layer and multilayer imageable elements have a substrate and at least one imageable layer and can be used to prepare positive-working lithographic printing plates. The imageable elements also include a radiation absorbing compound and a solvent-resistant polymer binder comprising an —N(R)—C(═X)—N(R′)—S(═O)2— moiety that is attached to the polymer backbone, wherein X is O or S, R and R′ are independently hydrogen, halo, or an alkyl group having 1 to 6 carbon atoms. This solvent-resistant polymer binder is located in the imageable layer closest to the substrate and provides improved chemical resistance.

REFERENCES:
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patent: 6143464 (2000-11-01), Kawauchi
patent: 6352811 (2002-03-01), Patel et al.
patent: 6969579 (2005-11-01), Kitson et al.
patent: 2002/0081522 (2002-06-01), Miyake et al.
patent: 1 522 417 (2005-04-01), None
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patent: WO 2005/018934 (2005-03-01), None
JP abstract 11-119419 (Apr. 30, 1999), Kawachi Ikuo.
U.S. Appl. No. 11/337,778 (D-91856/JLT), filed Jan. 23, 2006, titledMultilayer Imageable Element Containing Sulfonamido Resin,by Saraiya et al.

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