Image sensor and production method thereof

Radiant energy – Photocells; circuits and apparatus – Photocell controlled circuit

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Details

250578, 357 2, H01J 4014

Patent

active

048899836

ABSTRACT:
An image sensor includes an amorphous silicon photodiode on an insulating substrate, an amorphous silicon thin film transistor disposed on the same substrate for reading out charges stored by said photodiode, and a wiring film as a source/drain electrode of said transistor and as a first electrode of the photodiode free of steps. The image sensor may include a matrix wiring section for taking out signals, a silicon film including a channel protection film for the transistor, an insulating film for the matrix wiring, and a second conductor of the matrix wiring connected with the source/drain electrode of the transistor and arranged in a direction generally normal to the source/drain electrode and disposed on the wiring film.

REFERENCES:
patent: 4763010 (1988-08-01), Fukaya et al.
patent: 4823178 (1989-04-01), Suda

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