Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...
Patent
1993-09-17
1994-08-09
Jackson, Jerome
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Field effect device in non-single crystal, or...
257 53, 257443, 257446, 257448, H01L 3104, H01L 2714
Patent
active
053369068
ABSTRACT:
An image sensor comprising a plurality of photo-electric conversion elements formed by layering a metal electrode, a photo-electric conversion layer, and a translucent electrode, the translucent electrode being divided into individual electrodes which are provided for the respective photo-electric conversion elements, and wherein at least the surfaces of the photo-electric conversion layer adjoining the translucent electrodes which appear between the individual electrodes are removed.
REFERENCES:
patent: 4281208 (1981-07-01), Kuwano et al.
patent: 4446364 (1984-05-01), Hayashi et al.
patent: 4678542 (1987-07-01), Boer et al.
patent: 4680085 (1987-07-01), Vijan et al.
patent: 4754152 (1988-06-01), Hayama et al.
Ito Hisao
Suzuki Tei-ichi
Fuji 'Xerox Co., Ltd.
Jackson Jerome
LandOfFree
Image sensor and method of manufacture does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Image sensor and method of manufacture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Image sensor and method of manufacture will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-217746