Image sensor and method for manufacturing the same

Details Image sensor and method for manufacturing the same Image sensor and method for manufacturing the same

2011-01-04

2011-01-04

Smith, Zandra (Department: 2822)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S066000, C438S070000, C438S098000, C257SE31121, C257SE31124, C257SE31127

Reexamination Certificate

active

07863073

ABSTRACT:
An image sensor and a method for manufacturing the same are provided. The image sensor comprises at least one unit pixel, an interlayer dielectric, a color filter, a planarization layer, and a microlens. The microlens has a smooth surface after performing a plasma treatment process.

REFERENCES:
patent: 7253018 (2007-08-01), Kim
patent: 7294524 (2007-11-01), Park
patent: 2007/0161147 (2007-07-01), Kim
patent: 10-2004-0059459 (2006-02-01), None
patent: 10-2004-0112057 (2006-06-01), None
patent: 10-2005-0100204 (2007-03-01), None

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