Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2011-01-11
2011-01-11
Ngo, Ngan (Department: 2893)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S067000, C438S091000, C438S459000, C438S514000, C257SE21545
Reexamination Certificate
active
07867808
ABSTRACT:
Embodiments relate to an image sensor and a method of manufacturing an image sensor. According to embodiments, an image sensor may include a first substrate, a photodiode, and an ion implantation isolation layer. According to embodiments, circuitry including a metal interconnection may be disposed over the first substrate. A photodiode may be provided in a crystalline semiconductor layer bonded to the first substrate, and electrically connected to the metal interconnection. The ion implantation isolation layer may be provided in the photodiode.
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Dongbu Hi-Tek Co., Ltd.
Ngo Ngan
Sherr & Vaughn, PLLC
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