Image sensor and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Light responsive structure

Reexamination Certificate

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C438S016000, C438S031000

Reexamination Certificate

active

07728351

ABSTRACT:
An image sensor provides enhanced integration of transistor circuitry and photo diodes. The image sensor simultaneously improves resolution and sensitivity. An image sensor an a method for manufacturing prevents defects in a photo diode by adopting a vertical photo diode structure. An image sensor includes a substrate which may include at least one circuit element. A bottom electrode and a first conductive layer may be sequentially formed over the substrate. A strained intrinsic layer may be formed over the first conductive layer. A second conductive layer may be formed over the strained intrinsic layer. An upper electrode may be formed over the second conductive layer.

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Shu Bin, Zhang He-Ming, Ren Dong-Ling, Wang Wei, Simulation Study of Electrical Properties of CMOS Based on Strained Si/Si Ge, China, May 2007.

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