Image sensor and manufacturing method of image sensor

Details Image sensor and manufacturing method of image sensor Image sensor and manufacturing method of image sensor

2006-03-31

2008-12-16

Thai, Luan (Department: 2891)

Active solid-state devices (e.g., transistors, solid-state diode

Responsive to non-electrical signal

Electromagnetic or particle radiation

C257S432000, C257S433000, C257S434000, C257S435000

Reexamination Certificate

active

07466001

ABSTRACT:
In a manufacturing method of an image sensor, a lightproof film (an antireflective film for avoiding flares) is formed over a wiring area; a transparent film is formed over an imaging area using a material capable of patterning; a transparent film, for forming micro lenses on top, is formed on the transparent film, wherein a height of the top surfaces of the transparent film and the lightproof film are evenly formed.

REFERENCES:
patent: 4783691 (1988-11-01), Harada
patent: 6365916 (2002-04-01), Zhong et al.
patent: 6376872 (2002-04-01), Pai et al.
patent: 6469832 (2002-10-01), Yotsuya et al.
patent: 6700134 (2004-03-01), Yamazaki et al.
patent: 6707067 (2004-03-01), Zhong et al.
patent: 2001/0019154 (2001-09-01), Yamazaki et al.
patent: 2002/0142498 (2002-10-01), Kubota et al.
patent: 2003/0043326 (2003-03-01), Sawasaki et al.
patent: 2004/0156105 (2004-08-01), Trapani et al.
patent: 9-293848 (1997-11-01), None

Affiliated with

Also associated with

Rating

Image sensor and manufacturing method of image sensor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Image sensor and manufacturing method of image sensor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Image sensor and manufacturing method of image sensor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4043290