Image sensor and manufacturing method of image sensor

Details Image sensor and manufacturing method of image sensor Image sensor and manufacturing method of image sensor

2006-07-18

2006-07-18

Thai, Luan (Department: 2891)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

C438S057000, C438S069000, C438S070000, C438S072000, C438S066000

Reexamination Certificate

active

07078258

ABSTRACT:
In a manufacturing method of an image sensor, a lightproof film (an antireflective film for avoiding flares) is formed over a wiring area; a transparent film is formed over an imaging area using a material capable of patterning; a transparent film, for forming micro lense on top, is formed on the transparent film, wherein a height of the top surfaces of the transparent film and the lightproof film are evenly formed.

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patent: 2004/0156105 (2004-08-01), Trapani et al.
patent: 9-293848 (1997-11-01), None

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