Image sensor and fabricating method thereof

Details Image sensor and fabricating method thereof Image sensor and fabricating method thereof

2007-11-01

2010-11-09

Garber, Charles D (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S057000, C438S069000, C257SE21001

Reexamination Certificate

active

07829370

ABSTRACT:
An image sensor and fabricating method thereof which reduces a light intensity differential between a pixel center and a pixel edge and prevents crosstalk. The image sensor can include a plurality of convex lens provided within a passivation layer and in vertical alignment with a corresponding photodiode, each convex lens including a color filter; having a predetermined color array, and a plurality of microlens provided over the passivation layer and in vertical alignment with a corresponding color filer.

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