Image sensor and fabricating method thereof

Optical: systems and elements – Single channel simultaneously to or from plural channels – By surface composed of lenticular elements

Reexamination Certificate

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C359S619000

Reexamination Certificate

active

07605980

ABSTRACT:
An image sensor and fabricating method thereof are provided. The image sensor can include differently microlenses formed on a pixel array substrate. The differently shaped microlenses are formed using a phase mask where the light blocking region for each microlens pattern is positioned according to the relative angle of the microlens to a main lens. The phase shift mask results in a dome shaped microlens at a region of the pixel array substrate receiving incident light from the same axis as light incident the main lens and in asymmetrical shaped microlenses with a thicker region in a portion of the microlens farthest from the dome shaped microlens.

REFERENCES:
patent: 2006/0023314 (2006-02-01), Boettiger et al.
patent: 2007/0063300 (2007-03-01), Hwang
patent: 1998-10-143708 (1999-12-01), None
patent: 10-2003-0027019 (2004-11-01), None

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