Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1983-11-22
1985-05-07
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430270, 430330, 430346, 430495, 430945, 428913, 346200, 346216, G03F 900
Patent
active
045158770
ABSTRACT:
A resist film comprises a dimensionally stable base (B), which is transparent to actinic light in the wavelength range from 300 to 420 nm, and a mask-forming layer (ML) which is sensitive to heat radiation and contains a thermochromic system which, when irradiated with an IR laser having a wavelength greater than 1.00 .mu.m, undergoes an irreversible change in its absorption spectrum in the wavelength range from 300 to 420 nm so that the optical density of the mask-forming layer (ML) in this wavelength range changes by not less than 1.3 units. The base of the resist film can also be applied onto the photosensitive relief-forming layer (RL) of a recording material to give a multilayer image-recording material. Imagewise irradiation with heat, for example using an IR laser, produces, in the mask-forming layer (ML) of the resist film, a UV photomask which is very useful for exposing photosensitive recording materials.
REFERENCES:
patent: 4225659 (1980-09-01), Drexler
patent: 4450023 (1984-05-01), De Blauwe
Barzynski Helmut
Holoch Klaus
BASF - Aktiengesellschaft
Dees Jos,e G.
Kittle John E.
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